PELCO®硅光圈镜架（不带支撑膜） 21545 桑戈国际贸易（上海）有限公司

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产品名称：PELCO®硅光圈镜架（不带支撑膜）
产品型号：21545
产品厂商：其它品牌
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简单介绍：

The PELCO® Silicon Aperture Frames are 3mm disc-type frames with a thickness of 200µm and square or rectangular apertures. They are useful for a variety of applications: Support frame to attach TEM l

详情介绍：

Product Specifications
Single Aperture Opening Sizes: 0.25 x 0.25mm, 0.5 x 0.5mm, 0.75 x 0.75mm, 1 x 1mm, and 0.5 x 1.5mm
Multiple Aperture Opening Sizes: 9 windows of 0.1 x 0.1mm in a 3 x 3 array or 2 windows of 0.1 x 1.5mm
Window Side Angle: 35.26°
Aperture Frame Thickness: 200µm
Aperture Frame Diameter: 3mm
Aperture Material: Si
Surface: Top side Si, back side (larger opening) has 50nm layer of Si3N4 for single aperture and 15nm Si3N4 for multiple apertures.
Packaging: The PELCO® Silicon Aperture Frames are packaged under cleanroom conditions in the PELCO® #160 TEM Grid Storage Box. Each box holds 10 Aperture Frames.

Prod #	Description	Unit

21545-10

PELCO® Silicon Aperture Frame (no support film), 0.25x0.25mm

pkg/10

21540-10

PELCO® Silicon Aperture Frame (no support film), 0.5x0.5mm

pkg/10

21543-10

PELCO® Silicon Aperture Frame (no support film), 0.75x0.75mm

pkg/10

21541-10

PELCO® Silicon Aperture Frame (no support film), 1.0x1.0mm

pkg/10

21542-10

PELCO® Silicon Aperture Frame (no support film), 0.5x1.5mm

pkg/10

21548-10

PELCO® Silicon Aperture Frame (no support film), with 2 each 0.1x1.5mm apertures

pkg/10

21549-10

PELCO® Silicon Aperture Frame (no support film), with 9 each 0.1x0.1mm apertures

pkg/10

PELCO^® Silicon Nitride Coated and Si 3mm Discs (blanks)

These 3mm Silicon discs have an ultra-flat (Ra 0.45 ± 0.2nm) 50nm ultra-low-stress Silicon Nitride layer on both sides. Also available with a hydrophilic or hydrophobic surface coating or just as a silicon disk. The disks are made with the same state-of-the-art manufacturing techniques as the PELCO® Silicon Nitride Support Films. The disk are perfectly round and have the Easygrip™ edge for easy handling. Clean surface, no broken edges and free of debris often associated with other manufacturing processes. The ultra-low-stress film is nonstoichiometric and closer to SiN than Si3N4. They can be used for a number of applications:
Specimen mounts for SEM and FESEM applications
Specimen discs for AFM applications
Blanks to build the PELCO® Liquid Cell™ together with the PELCO® Silicon Nitride Membrane
Product Specifications
Film Thickness: 50nm ultra-low-stress Silicon Nitride on both sides
Hydrophilic: 5nm atomic layer-deposited hydroxylated alumina on 50nm ultra-low-stress silicon nitride More Details
Hydrophobic: 5nm atomic layer-deposited alumina and fluoro-methylsilane on ultra-low-stress silicon nitride. More Details
Disk Thickness: 200µm silicon support
Disk Diameter: 3mm
Surface Roughness: The RMS (Rq) is 0.65 +/- 0.06nm which gives a mean roughness (Ra) of 0.45 +/- 0.02nm
Packaging: The PELCO® Silicon Aperture Frames are packaged under cleanroom conditions in the PELCO® #160 TEM Grid Storage box. Each box holds 10 discs.