产品名称：用于TEM的PELCO®氮化硅支撑膜

Silicon Nitride Support Films have the advantages of being chemically and mechanically robust and can withstand temperature changes up to 1000°C. They are extremely stable and suitable to conduct a variety of nanotechnology experiments with particles or cells mounted directly on the support films.

The PELCO® Silicon Nitride Support Films are indispensable tools for virtually all fields of nanotechnology research. They enable direct deposition and in situ observations of dynamic reactions over a wide temperature range. The support film can be used as a passive support film but can also play a role as an active participant in experiments.
 

Iron nanoparticles dispersed on a SiN support film and oxidized at 350°C while supported on the PELCO® SiN support films. The image shows the product of the oxidization process: hollow iron oxide nanoparticles.
Haitao Liu, Dept. of Chemistry, UC Berkeley, California.

PELCO® Silicon Nitride Support Films are manufactured using state-of-the-art semiconductor and MEMS manufacturing techniques. The Silicon Nitride Support Film is grown on a silicon wafer to the desired membrane thickness of 8, 15, 50, or 200nm. The specimen viewing area is created by etching away a window in the silicon substrate, leaving a perfectly smooth, resilient and chemically robust silicon nitride film. The frame is manufactured as a 3mm silicon disc with smooth EasyGrip™ edges for easy manipulation by tweezers and will fit perfectly in standard TEM holders. Standard thickness of the silicon frame is 200µm which will fit most TEM holders. A special version with a 50µm thickness and a 0.25 x 0.25mm window is available for special TEM holders which only accomadate thinner supports. Easy handling capabilities and smoothness of the edges are design advantages over other brands of silicon nitride support films. The PELCO® Silicon Nitride Support Films are manufactured like grids and are completely free from debris particles. The mechanical and chemical stability allow for cleaning of the Silicon Nitride Support Films with chemicals (solvents, acids and bases), glow discharge and plasma cleaning. It is recommended that ultrasonic cleaning not be used, as it can easily shatter the Silicon Nitride Support Films.

Prod #	Description	Unit

8nm membrane thickness / 25 apertures / 200µm frame thickness
21510-10	Silicon Nitride Support Film, 8nm, 75x75µm Apertures (25) on 0.6x0.6mm Window	pkg/10

15nm membrane thickness / 200µm frame thickness
21560-10	Silicon Nitride Support Film, 15nm with 0.25x0.25mm Window	pkg/10

21568-10

Silicon Nitride Support Film, 15nm with 2 each 0.1x1.5mm Windows

pkg/10

21569-10

Silicon Nitride Support Film, 15nm with 9 each 0.1x0.1mm Windows

pkg/10

50nm membrane thickness / 200µm frame thickness
21505-10	Silicon Nitride Support Film, 50nm with 0.25x0.25mm Window	pkg/10

21505-100

Silicon Nitride Support Film, 50nm with 0.25x0.25mm Window

pkg/100

21500-10

Silicon Nitride Support Film, 50nm with 0.5x0.5mm Window

pkg/10

21500-100

Silicon Nitride Support Film, 50nm with 0.5x0.5mm Window

pkg/100

21501-10

Silicon Nitride Support Film, 50nm with 0.75x0.75mm Window

pkg/10

21501-100

Silicon Nitride Support Film, 50nm with 0.75x0.75mm Window

pkg/100

21502-10

Silicon Nitride Support Film, 50nm with 1.0x1.0mm Window

pkg/10

21502-100

Silicon Nitride Support Film, 50nm with 1.0x1.0mm Window

pkg/100

21504-10

Silicon Nitride Support Film, 50nm with 0.5x1.5mm Window

pkg/10

21504-100

Silicon Nitride Support Film, 50nm with 0.5x1.5mm Window

pkg/100

21508-10

Silicon Nitride Support Film, 50nm with 2 each 0.1x1.5mm Windows

pkg/10

21509-10

Silicon Nitride Support Film, 50nm with 9 each 0.1x0.1mm Windows

pkg/10

200nm membrane thickness / 200µm frame thickness
21525-10	Silicon Nitride Support Film, 200nm with 0.25x0.25mm Window	pkg/10

21525-100

Silicon Nitride Support Film, 200nm with 0.25x0.25mm Window

pkg/100

21520-10

Silicon Nitride Support Film, 200nm with 0.5x0.5mm Window

pkg/10

21520-100

Silicon Nitride Support Film, 200nm with 0.5x0.5mm Window

pkg/100

21521-10

Silicon Nitride Support Film, 200nm with 0.75x0.75mm Window

pkg/10

21521-100

Silicon Nitride Support Film, 200nm with 0.75x0.75mm Window

pkg/100

21522-10

Silicon Nitride Support Film, 200nm with 1.0x1.0mm Window

pkg/10

21522-100

Silicon Nitride Support Film, 200nm with 1.0x1.0mm Window

pkg/100

21524-10

Silicon Nitride Support Film, 200nm with 0.5x1.5mm Window

pkg/10

21524-100

Silicon Nitride Support Film, 200nm with 0.5x1.5mm Window

pkg/100

21528-10

Silicon Nitride Support Film, 200nm with 2 each 0.1x1.5mm Windows

pkg/10

21529-10

Silicon Nitride Support Film, 200nm with 9 each 0.1x0.1mm Windows

pkg/10

50nm membrane thickness / 50µm frame thickness
21570-10	Silicon Nitride Support Film, 50nm on 50µm frame thickness with 0.25x0.25mm Window	pkg/10

21578-10

Silicon Nitride Support Film, 50nm on 50µm frame thickness with 2 each 0.1x1.5mm Windows

pkg/10

21579-10

Silicon Nitride Support Film, 50nm on 50µm frame thickness with 9 each 0.1x0.1mm Windows

pkg/10