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产品详情
简单介绍:
LUXFilm™ TEM Supports are strong electron transparent, thin films that can span large open areas within the standard 3mm TEM grid diameter. They are available as unobstructed areas up to 2mm diameter
详情介绍:
Features and benefits of LUXFilm™ TEM Supports:
Strong - LUXFilm™ is about 5x stronger than formvar. The films are compatible with a variety of common stains and ethanol based solutions (not for use with ammonium molybdate stains).
Large unobstructed viewing area - LUXFilm™ TEM Supports enable imaging of the entire specimen without interference from grid bars.
Flat - The films are stretched on a copper or nickel supporting frame, exhibiting superior flatness. Used for particle counting or screening applications, meniscus effects are eliminated: particles spread more evenly and do not collect next to grid bars.
Excellent beam stability - The films exhibit very little drift or charging effects in the TEM compared with formvar/carbon. Suitable for electron beam energies from 80 - 300kV.
Wettability - LUXFilm™ has a favorably inherent surface energy, when glow discharge treated, for epoxy-embedded sections. Serial ribbons lat down flat and tend to "stick" to the film. Surface treatment can be performed to prepare the supports for negative stains and acrylic-embedded specimens.
No autofluorescence - LUXFilm™ supports exhibit no autofluorescence and no unspecific labeling with antibody stains. This will make the films an ideal choice for correlative microscopy and immunocytochemistry in the EM. The large viewing area will assure that all labeled features are visible.
Applications areas for the LUXFilm™ TEM Support films are in demanding and routine TEM imaging with electron beam energies preferably in the 80-300kV range for:
· Large sections
· Tomography
· Thick materials
· Pathology
· Immunocytochemistry
Strong - LUXFilm™ is about 5x stronger than formvar. The films are compatible with a variety of common stains and ethanol based solutions (not for use with ammonium molybdate stains).
Large unobstructed viewing area - LUXFilm™ TEM Supports enable imaging of the entire specimen without interference from grid bars.
Flat - The films are stretched on a copper or nickel supporting frame, exhibiting superior flatness. Used for particle counting or screening applications, meniscus effects are eliminated: particles spread more evenly and do not collect next to grid bars.
Excellent beam stability - The films exhibit very little drift or charging effects in the TEM compared with formvar/carbon. Suitable for electron beam energies from 80 - 300kV.
Wettability - LUXFilm™ has a favorably inherent surface energy, when glow discharge treated, for epoxy-embedded sections. Serial ribbons lat down flat and tend to "stick" to the film. Surface treatment can be performed to prepare the supports for negative stains and acrylic-embedded specimens.
No autofluorescence - LUXFilm™ supports exhibit no autofluorescence and no unspecific labeling with antibody stains. This will make the films an ideal choice for correlative microscopy and immunocytochemistry in the EM. The large viewing area will assure that all labeled features are visible.
Applications areas for the LUXFilm™ TEM Support films are in demanding and routine TEM imaging with electron beam energies preferably in the 80-300kV range for:
· Large sections
· Tomography
· Thick materials
· Pathology
· Immunocytochemistry
· Particle count and screening
Prod # | Description | Unit |
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Prod # | Description | Unit |
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Ø1.5mm open area on Cu support, 50nm film thickness |
|
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Ø1.5mm open area on Cu support, 50nm film thickness |
|
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Ø2.0mm open area on Cu support, 50nm film thickness |
|
|
Ø2.0mm open area on Cu support, 50nm film thickness |
|
|
2x1mm open area on Cu support, 50nm film thickness |
|
|
Ø1.5mm open area on Ni support, 50nm film thickness |
|
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Ø2.0mm open area on Ni support, 50nm film thickness |
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2x1mm open area on Ni support, 50nm film thickness |
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0.5mm area hex grid Cu support, 50nm film thickness |
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0.35 mesh grid Cu support, 50nm film thickness |
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0.3mm bar grid Cu support, 50nm film thickness |
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0.5mm area hex grid Ni support, 50nm film thickness |
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0.35mm mesh grid Ni support, 50nm film thickness |
|
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0.3mm bar grid Ni support, 50nm film thickness |
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Ø1.5mm open area on Cu support, 30nm film thickness |
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Ø2.0mm open area on Cu support, 30nm film thickness |
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2x1mm open area on Cu support, 30nm film thickness |
|
|
Ø1.5mm open area on Ni support, 30nm film thickness |
|
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Ø2.0mm open area on Ni support, 30nm film thickness |
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2x1mm open area on Ni support, 30nm film thickness |
|
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2x1mm open area on Ni support, 30nm film thickness |
|
|
0.5mm area hex grid Cu support, 30nm film thickness |
|
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0.35mm mesh grid Cu support, 30nm film thickness |
|
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0.3mm bar grid Cu support, 30nm film thickness |
|
|
0.5mm area hex grid Ni support, 30nm film thickness |
|
|
0.35mm mesh grid Ni support, 30nm film thickness |
|
|
0.3mm bar grid Ni support, 30nm film thickness |
|